Interface traps density-of-states as a vital component for hot-carrier degradation modeling

نویسندگان

  • Stanislav Tyaginov
  • Ivan Starkov
  • Oliver Triebl
  • Johann Cervenka
  • C. Jungemann
  • Sara Carniello
  • Jong Mun Park
  • Hubert Enichlmair
  • Markus Karner
  • Ch. Kernstock
  • Ehrenfried Seebacher
  • Rainer Minixhofer
  • Hajdin Ceric
  • Tibor Grasser
چکیده

We refine our approach for hot-carrier degradation modeling based on a thorough evaluation of the carrier energy distribution by means of a full-band Monte–Carlo simulator. The model is extended to describe the linear current degradation over a wide range of operation conditions. For this purpose we employ two types of interface states, either created by singleor by multiple-electron processes. These traps apparently have different densities of states which is important to consider when calculating the charges stored in these traps. By calibrating the model to represent the degradation of the transfer characteristics, we extract the number of particles trapped by both types of interface traps. We find that traps created by the singleand multiple-electron mechanisms are differently distributed over energy with the latter shifted toward higher energies. This concept allows for an accurate representation of the degradation of the transistor transfer characteristics. 2010 Elsevier Ltd. All rights reserved.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Interface states charges as a vital component for HC degradation modeling

We refine our approach for hot-carrier degradation modeling based on a thorough evaluation of the carrier energy distribution by means of a full-band Monte-Carlo simulator. The model is extended to describe the linear current degradation over a wide range of operation conditions. For this purpose we employ two types of interface states, namely, created by singleand by multiple-electron processe...

متن کامل

Degradation mechanisms in gate-all-around silicon Nanowire field effect transistor under electrostatic discharge stress – a modeling approach

The failure and degradation mechanisms of gate-all-around silicon nanowire FET subjected to electrostatic discharge (ESD) are investigated through device modeling. Transmission line pulse stress test is simulated and device degradation physics is modeled. The device degradation level, interface state concentration and hard breakdown are shown and analyzed. From the model, we found that ESD stre...

متن کامل

Accurate Extraction of MOSFET Interface State Spatial Distribution from Charge Pumping Measurements

The density of interface traps along the Si/SiO2 interface of a “fresh” MOSFET considerably depends on the fabrication process and the device geometry. Necessity to consider a number of factors having different physical nature results in the absence of established model describing initial transistor defect profile even nowadays. Unfortunately, theoretical calculation of the defect concentration...

متن کامل

A Simple Approach for Modeling the Influence of Hot-carriers on Threshold Voltage of Mos Transistors Mosfet’lerde Sicak Taþiyicilarin Eþýk Gerýlýmýne Etkýsýnýn Modellenmesý Ýçýn Yený Býr Yaklaþim

Hot-carrier-induced degradation of MOSFET parameters over time is an important reliability concept in modern microcircuits. High energy carriers also called hot carriers are generated in the MOSFET by the large channel electric field near the drain region. The electric field accelarates the carriers to effective temperatures well above the lattice temprature. These hot carriers transfer energy ...

متن کامل

Comprehensive Physical Modeling of Nmosfet Hot-carrier-induced Degradation

The role of hot-carrier-induced interface states in NMOSFETs is discussed. A new model is proposed based on measurements in several 0.7/~m CMOS technologies of different suppliers. Our model for the first time enables accurate interface state prediction over many orders of magnitude in time for all stress conditions under pinch-off and incorporates saturation. It can easily be implemented in a ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • Microelectronics Reliability

دوره 50  شماره 

صفحات  -

تاریخ انتشار 2010